| Version | Date | Notes |
|---|
| 1.05 | 9/27/23 | - An additional mask to mask design rule added to explain the relationship between the METAL1 and OUTLINE1 masking levels.
- GDS numbers for the OUTLINE2 and TAB masking levels swapped to better match natural assumptions.
- Added information about double patterning options.
|
| 1.04 | 8/10/23 | - Mask to mask design rule C changed to more accurately describe the alignment tolerance between masks rather than layers.
|
| 1.03 | 7/10/23 | - Process step 7 now correctly shows that the resist is patterned with the OUTLINE1 mask.
|
| 1.02 | 5/4/23 | - Process step 10 now correctly shows that the etches of the OUTLINE1 and VIA masking levels occur simultaneously.
|
| 1.01 | 4/3/23 | - Full explanation of connective tabs added.
- Full explanation of release area mechanics added.
|
| 1.0 | 3/10/23 | - Initial document release.
|
This preliminary product datasheet may change without notice.